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China EUV Lithography Development Gap vs ASML

A UBS report finds China's EUV lithography technology lags ASML by roughly a decade, though Chinese firms may narrow the gap faster in older DUV lithography.

1. 9/3/2026UBS: China's EUV Lithography Development Trails ASML by About 10 Years

   A new UBS report finds China's progress in extreme ultraviolet (EUV) chip-making technology resembles ASML's status around 2004, suggesting Chinese manufacturers remain roughly a decade behind in this critical area, even as they may close the gap faster in older DUV lithography.