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Samsung and TSMC Delay High-NA EUV Adoption to 2030
Samsung confirmed it will postpone adoption of ASML's High-NA EUV lithography machines until its 1nm (A10) node around 2030, mirroring TSMC's similar delay decision.
- Samsung Delays High-NA EUV Adoption, Following TSMC's Lead, Until 1nm Node in 2030
Samsung Electronics has confirmed it will hold off on adopting ASML's High-NA EUV lithography machines until its 1-nanometer (A10) process node, expected around 2030, joining TSMC in postponing use of the costly tools.